Formation of Ultra Narrow Lamellar Structures in POSS-containing Triblock Terpolymers
-
- Goseki Raita
- Department of Organic and Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology
-
- Ishizune Takashi
- Department of Organic and Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology
-
- Hirao Akira
- Department of Organic and Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology
-
- Hayakawa Teruaki
- Department of Organic and Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology
この論文をさがす
抄録
An ultra narrow line structure was prepared in the lamellar morphology of polyhedral oligomeric silsesquioxane (POSS)-containing triblock terpolymer in the bulk via the self-assembly. The triblock terpolymers, which comprised polystyrene, POSS-containing poly(methacrylate) (PMAPOSS) and poly(methyl methacrylate), were synthesized by anionic polymerization. The self-assembled structures were studied by using a transmission electron microscopy (TEM) and a small-angle X-ray scattering (SAXS). It was found that a narrow PMAPOSS domain was layered in triple-domain lamellar, which caused by the effect of strongly segregation with the middle PMAPOSS block. The total d-spacing was 32 nm, and the smallest width of PMAPOSS domain layer was ca. 4 nm.
収録刊行物
-
- Journal of Photopolymer Science and Technology
-
Journal of Photopolymer Science and Technology 26 (1), 39-44, 2013
フォトポリマー学会
- Tweet
詳細情報 詳細情報について
-
- CRID
- 1390001204325466880
-
- NII論文ID
- 130004464987
- 40019685421
-
- NII書誌ID
- AA11576862
-
- COI
- 1:CAS:528:DC%2BC3sXhtFalurnF
-
- ISSN
- 13496336
- 09149244
-
- NDL書誌ID
- 024660148
-
- 本文言語コード
- en
-
- データソース種別
-
- JaLC
- NDL
- Crossref
- CiNii Articles
- KAKEN
-
- 抄録ライセンスフラグ
- 使用不可