Development of Photosensitive Alicyclic Polyimides Based on Reaction Development Patterning
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- Yasuda Megumi
- Department of Advanced Materials Chemistry, Faculty of Engineering, Yokohama National University
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- Takahashi Akio
- Department of Advanced Materials Chemistry, Faculty of Engineering, Yokohama National University
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- Oyama Toshiyuki
- Department of Advanced Materials Chemistry, Faculty of Engineering, Yokohama National University
この論文をさがす
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 26 (3), 357-360, 2013
フォトポリマー学会
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詳細情報 詳細情報について
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- CRID
- 1390001204325501056
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- NII論文ID
- 130004721121
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BC3sXhtFCmtL%2FF
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 024660703
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
- KAKEN