Capabilities and Limitations of Plasma Polymerized Methylsilane (PPMS) All-Dry Lithography.
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- Dabbagh Gary
- Bell Labs-Lucent Technologies
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- Hutton Richard S.
- Bell Labs-Lucent Technologies
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- Cirelli Raymond A.
- Bell Labs-Lucent Technologies
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- Novembre Anthony E.
- Bell Labs-Lucent Technologies
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- Reichmanis Elsa
- Bell Labs-Lucent Technologies
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- Nalamasu Omkaram
- Bell Labs-Lucent Technologies
書誌事項
- タイトル別名
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- Capabilities and Limitations of Plasma
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In this paper we report the results of a feasibility study of manufacturability of processes using plasma polymerized methylsilane (PPMS) as both a single-layer and a bilayer resist in both negative and positive tone development modes. PPMS has shown great promise as the basis for an all dry lithographic process. The photosensitive polymer is deposited in a low power plasma of methylsilane gas and is comprised of a Si-Si bonded network. PPMS undergoes efficient photo-oxidative crosslinking upon exposure to 248 or 193nm light in air to form an oxide-like material (PPMSO). We have identified several structural differences of films deposited at different temperatures and have correlated those differences to the air stability and the photosensitivity of PPMS films. We have also examined the effect of laser pulse power and repetition rate on the efficiency of exposure and conclude that the rate of oxygen diffusion into the film limits the effectiveness of high laser power for increasing the throughput of an exposure tool. We have concluded that positive tone PPMS processing is not practical because of the slow diffusion of oxygen through the film, required for effective photo-oxidation of PPMS to occur.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 11 (4), 651-661, 1998
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詳細情報 詳細情報について
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- CRID
- 1390001204325877376
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- NII論文ID
- 130003488120
- 40005351849
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DyaK1cXkslKhtrw%3D
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 4525949
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可