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- Johnson D. W.
- MicroChem Corp.
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- Jeffries A.
- MicroChem Corp.
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- Minsek D. W.
- MicroChem Corp.
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- Hurditch R. J.
- MicroChem Corp.
書誌事項
- タイトル別名
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- Improving the Process Capability of SU-8. Part II.
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説明
SU-8 Resists are used widely in the development and fabrication of MEMS devices [1-4]. The resist's images are the product of photochemical and thermal cationic processes and result in vertical sidewalls and high aspect ratio features. These are among SU-8's most desirable attributes. The process, which creates the desirable images, however, generates considerable internal stress, which produces cracked features. It would be beneficial, therefore, to investigate modifications of the SU-8 resist formulation which incorporate materials that will attenuate stress cracking without significant image degradation.<br>Work reported previously by IBM focused on compositions containing SU-8 targeted for applications in which lithographic performance could be sacrificed for high flexibility [5]. In this paper we present our results of studies directed toward the selection of materials compatible with SU-8, which will significantly reduce cracking and also retain high aspect ratios images and vertical sidewalls. To this end, we examined mono and polyfunctional epoxides from the following chemical classes; siloxanes, urethanes, cycloaliphatics, a bicycloaliphatic copolymer with phenol, bisphenol-A derivatives, a long chain aliphatic polyol and some long chain aliphatic esters.<br>This work allowed us to identify compositions having improved crack resistance and adhesion over standard SU-8 resist, without sacrificing lithographic performance, which may provide benefits for applications such as a dielectric barrier.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 14 (5), 689-694, 2001
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詳細情報 詳細情報について
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- CRID
- 1390001204326015232
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- NII論文ID
- 130003488425
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD38XitVCjtr0%3D
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 6042734
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可