A New Aqueous Developable Positive Tone Photodefinable Polyimide for a Stress Buffer Coat of Semiconductor; HD-8000.
-
- Nunomura Masataka
- Yamazaki Research & Development Center, Hitachi Chemical DuPont Micro Systems Co.Ltd.
-
- Ohe Masayuki
- Yamazaki Research & Development Center, Hitachi Chemical DuPont Micro Systems Co.Ltd.
Bibliographic Information
- Other Title
-
- New Aqueous Developable Positive Tone Photodefinable Polyimide for a Stress Buffer Coat of Semiconductor HD 8000
Search this article
Description
A new aqueous developable positive tone photodefinable polyimide was prepared from poly(hydroxy amic acid) and naphthoquinonediazide for semiconductor stress buffer coat, which exhibits excellent photolithographic properties in high resolution, wide focus latitude and good stability for process holding time, with equivalent film properties to conventional non-photodefinable polyimide. Through dry etching evaluation of the SiN passivation layer, it was confirmed that the cured polyimide pattern works as an etching mask.
Journal
-
- Journal of Photopolymer Science and Technology
-
Journal of Photopolymer Science and Technology 14 (5), 717-722, 2001
The Society of Photopolymer Science and Technology(SPST)
- Tweet
Details 詳細情報について
-
- CRID
- 1390001204326018816
-
- NII Article ID
- 130003488429
- 40005352097
-
- NII Book ID
- AA11576862
-
- COI
- 1:CAS:528:DC%2BD38XitVCjt74%3D
-
- ISSN
- 13496336
- 09149244
-
- NDL BIB ID
- 6042792
-
- Text Lang
- en
-
- Data Source
-
- JaLC
- NDL
- Crossref
- CiNii Articles
-
- Abstract License Flag
- Disallowed