A New Aqueous Developable Positive Tone Photodefinable Polyimide for a Stress Buffer Coat of Semiconductor; HD-8000.
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- Nunomura Masataka
- Yamazaki Research & Development Center, Hitachi Chemical DuPont Micro Systems Co.Ltd.
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- Ohe Masayuki
- Yamazaki Research & Development Center, Hitachi Chemical DuPont Micro Systems Co.Ltd.
書誌事項
- タイトル別名
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- New Aqueous Developable Positive Tone Photodefinable Polyimide for a Stress Buffer Coat of Semiconductor HD 8000
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説明
A new aqueous developable positive tone photodefinable polyimide was prepared from poly(hydroxy amic acid) and naphthoquinonediazide for semiconductor stress buffer coat, which exhibits excellent photolithographic properties in high resolution, wide focus latitude and good stability for process holding time, with equivalent film properties to conventional non-photodefinable polyimide. Through dry etching evaluation of the SiN passivation layer, it was confirmed that the cured polyimide pattern works as an etching mask.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 14 (5), 717-722, 2001
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詳細情報 詳細情報について
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- CRID
- 1390001204326018816
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- NII論文ID
- 130003488429
- 40005352097
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD38XitVCjt74%3D
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 6042792
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可
