Control Photo and Thermal Decomposition of Diazo/PVA and Diazo/PVAc Resist with Inclusion Compounds

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  • Control of Photo and Thermal Decomposition of Diazo/PVA and Diazo/PVAc Resist with Inclusion Compounds

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Photo and thermal decompositions of a diphenylamine-4-diazonium sulfate/formaldehyde condensate (DSR) / polyvinyl alcohol (PVA) resist containing a little polyvinyl acetate (PVAc) units :DSR/PVA emulsion film: were supressed by forming a complex with 18-crown-6 (18C6) at the diazo group, while both decompositions of the DSR/PVA emulsion film with polyethylene glycol 300 (PEG) which includes the benzene ring of the diazo compound was accelerated. Photo decomposition rate of the DSR/PVA resist with β-cyclodextrin (CD) which includes also the benzene ring of the diazo compound did not change, but thermal decomposition was suppressed. The DSR-PVA emulsion film showed blue color. The coloring of the DSR-PVA emulsion films was suppressed by inclusion of 18C6 or PEG.

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