Cryogenic Aerosol Cleaning Technology for Advanced Semiconductor Manufacturing Process

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  • 先端の半導体製造プロセスに用いられるエアロゾル洗浄技術
  • センタン ノ ハンドウタイ セイゾウ プロセス ニ モチイラレル エアロゾル センジョウ ギジュツ

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Abstract

Cryogenic aerosol cleaning is a very unique technology that cleans without the use of chemicals and de-ionized water. With optimization of recipe parameters, this technology will provide solutions for the significant problems or difficulties in new materials, e.g., high-k or metal gate, fragile porous low-k, sensitive gate pattern for 65 nm node, in which the conventional wet cleaning may not meet the requirements. As the technology node goes on for 45 nm node beyond, cryogenic aerosol technology will be required to be implemented for advanced production line.

Journal

  • Earozoru Kenkyu

    Earozoru Kenkyu 22 (1), 11-13, 2007

    Japan Association of Aerosol Science and Technology

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