書誌事項
- タイトル別名
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- Evaluation of the Cleanliness of Ultrapure Water by the Analysis for Metal Concentration Depositted on Si Wafer Surface Using Vapor Phase Decomposition/Inductively Coupled Plasma Mass Spectrometry
- 年間特集「水」--アナリティカルレポート 気相分解/誘導結合プラズマ質量分析法を用いたシリコンウェハー表面金属分析による超純水水質評価
- ネンカン トクシュウ ミズ アナリティカルレポート キソウ ブンカイ ユウドウ ケツゴウ プラズマ シツリョウ ブンセキホウ オ モチイタ シリコンウェハー ヒョウメン キンゾク ブンセキ ニ ヨル チョウジュンスイ スイシツ ヒョウカ
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Along with the shrinkage of LSI geometries, a higher quality of ultrapure water has been continuously required. Analytical technology for ultrapure water has also progressed before ultrapure water production technology improvements. In this study, we performed optimization of the analytical conditions for the direct analysis of acid droplets, and established an analytical technology for measurements of trace amounts of metallic impurities deposited on a wafer surface by means of Vapor Phase Decomposition (VPD)/Inductively Coupled Plasma Mass Spectrometry (ICP-MS). As a result, analytical technology for metallic elements of the 1 × 108 atoms/cm2 level on wafer surface has been established. By applying analytical technology to the wafer that has been contacted with ultrapure water, a new evaluation technology for ultrapure water quality by means of wafer surface contamination has been established. We confirmed good correlations between metal contamination of the wafer surface and the concentration in ultrapure water. This new quality evaluation technology is expected to contribute a further improvement of ultrapure water for future LSI manufacturing.
収録刊行物
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- 分析化学
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分析化学 59 (7), 559-563, 2010
公益社団法人 日本分析化学会
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詳細情報 詳細情報について
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- CRID
- 1390001204355074944
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- NII論文ID
- 10030698502
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- NII書誌ID
- AN00222633
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- NDL書誌ID
- 10773113
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- ISSN
- 05251931
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
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- 抄録ライセンスフラグ
- 使用不可