ダイヤモンドの高圧合成  放射光蛍光X線分析を用いる合成ダイヤモンドの不純物解析

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タイトル別名
  • Characterization of Impurities in Synthetic Diamonds by Using Synchrotron Radiation X-ray Fluorescence Analysis.
  • ホウシャコウ ケイコウ Xセン ブンセキ オ モチイル ゴウセイ ダイヤモンド

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抄録

Trace impurities in synthetic diamonds are characterized by using a scanning x-ray microprobe with synchrotron radiation. The diamond crystals analyzed were grown under high pressure and high temperature with the various metalic solvents. Utilizing synchrotron radiation (SR) x-ray fluorescence (XRF) analysis, concentrations of trace impurities down to 0. 1 ppm can be evaluated. Moreover, the x-ray energy dependence of XRF yield around the absorption edge shows the near-edge x-ray absorption fine structure of the trace impurities, which provides chemical-state information on the trace impurities in the diamond crystal. The future expectation of analytical capability with the next generation synchrotron light source is also described.

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