書誌事項
- タイトル別名
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- Control and Drying Process of Liquid Droplet remained on a wafer in Marangoni Drying
- マランゴニ カンソウ ニ オケル ウェーハ ジョウ ザンリュウ エキテキ ノ カンソウ カテイ ト ソノ セイギョ
この論文をさがす
説明
To clarify the mechanism of drying behavior of droplet remained on a silicon wafer in Marangoni drying used for rinsing and drying process in semiconductor manufacturing industries, the drying time of the droplet during organic gas dissolution have been investigated by using a CCD camera. And the concentration of organic component in the droplet has been measured with a micro-optical concentration sensor. In addition, numerical method that evaluating the drying time and the concentration is derived from phase equilibrium has been analyzed. There are qualitatively in good agreement. Finally, to get a guide line for decreasing watermark, organic and water concentration of atmosphere gas required have been proposed by using the numerical analysis.
収録刊行物
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- 日本伝熱学会論文集
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日本伝熱学会論文集 18 (2), 83-91, 2010
社団法人 日本伝熱学会
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詳細情報 詳細情報について
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- CRID
- 1390001204414748672
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- NII論文ID
- 10026961473
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- NII書誌ID
- AA11358679
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- ISSN
- 18822592
- 09189963
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- NDL書誌ID
- 10645405
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- 本文言語コード
- ja
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- 資料種別
- journal article
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- データソース種別
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- JaLC
- NDLサーチ
- CiNii Articles
- KAKEN
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- 抄録ライセンスフラグ
- 使用不可
