High Speed Surface Micro-Polishing for Spurious Reduction of Small Quartz Crystal Blanks
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- Hatsuzawa Takeshi
- Precision and Intelligence Laboratory, Tokyo Institute of Technology
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- Hamano Hisashi
- Precision and Intelligence Laboratory, Tokyo Institute of Technology
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- Saito Masashi
- Precision and Intelligence Laboratory, Tokyo Institute of Technology
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- Yanagida Yasuko
- Precision and Intelligence Laboratory, Tokyo Institute of Technology
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説明
Surface polishing is required for small crystal blanks to eliminate frequency spurious generated by the infinite rectangular shape. From the productivity viewpoint, bi-convex or plano-cylindrical surface are generally used to realize the energy trapping at the central part of the blanks. So far barrel polishing is the common fabrication technology to obtain bi-convex surface, however, the surface is finished insufficiently and fabrication process takes longer time as the blank size becomes small. To solve this difficulty, two types of new surface micro-polishing mechanisms with fixed abrasive and arrayed blank arrangement are experimentally examined to obtain plano-cylindrical surface. The fastest finishing time of 10 s for a blank is achieved together with the spurious elimination.
収録刊行物
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- 電気学会論文誌E(センサ・マイクロマシン部門誌)
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電気学会論文誌E(センサ・マイクロマシン部門誌) 127 (1), 37-41, 2007
一般社団法人 電気学会
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詳細情報 詳細情報について
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- CRID
- 1390001204461063168
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- NII論文ID
- 10018660374
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- NII書誌ID
- AN1052634X
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- ISSN
- 13475525
- 13418939
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- NDL書誌ID
- 8626148
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可