書誌事項
- タイトル別名
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- 3-D Micro Machining of Photo Sensitive Glass Using Gray-Scale Mask
- グレイスケールマスク オ モチイタ ガラス ノ 3ジゲン ビサイ カコウ ギジュツ
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説明
A cost-effective gray-scale mask fabrication technique and three dimensional micromaching of photo sensitive glass has been developed. The gray-scale mask was fabricated with wide use computer apparatus, a 1/20 projector and an emulsion glass mask. Multi level structures can be achieved with one-step photolithography and etching process using a gray-scale mask which is modified with gray-scale patterns to vary the energy of UV-light. High aspect ratio complex 3-D structures with different depths of 0.1mm to 1.5mm have been fabricated by use of this technique. These surfaces of fabricated structures can be made smooth by polysilazane coating. The technique can be applied to fabrication of the elements in optical and biomedical applications.
収録刊行物
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- 電気学会論文誌E(センサ・マイクロマシン部門誌)
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電気学会論文誌E(センサ・マイクロマシン部門誌) 122 (11), 531-536, 2002
一般社団法人 電気学会
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詳細情報 詳細情報について
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- CRID
- 1390001204461416192
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- NII論文ID
- 10010455203
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- NII書誌ID
- AN1052634X
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- ISSN
- 13475525
- 13418939
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- NDL書誌ID
- 6345338
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
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- 抄録ライセンスフラグ
- 使用不可