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- Takenaka Hisataka
- NTT Advanced Technology Corporation
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- Hatayama Masatoshi
- NTT Advanced Technology Corporation
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- Ito Hisashi
- NTT Advanced Technology Corporation
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- Ohchi Tadayuki
- NTT Advanced Technology Corporation
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- Takano Akio
- NTT Advanced Technology Corporation
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- Kurosawa Satoru
- NTT Advanced Technology Corporation
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- Itoh Hiroshi
- National Institute of Advanced Industrial Science and Technology
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- Ichimura Shingo
- National Institute of Advanced Industrial Science and Technology
書誌事項
- タイトル別名
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- Development of Si/SiO<sub>2</sub> Multilayer Type AFM Tip Characterizers
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A new type of AFM tip characterizer used for characterizing nanostructures in the 10 nm to 100 nm range was developed. The characterizer was fabricated by preferential etching the edge of a cross sectioned Si/SiO2 multilayer. Both isolated line structures and line-and-space structures were fabricated. The structural and practical properties of the fabricated tip characterizer were evaluated, and it was shown that it can be used to characterize AFM tip shapes in the 10 nm to 100 nm range.
収録刊行物
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- Journal of Surface Analysis
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Journal of Surface Analysis 17 (3), 264-268, 2011
一般社団法人 表面分析研究会
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詳細情報 詳細情報について
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- CRID
- 1390001204471328128
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- NII論文ID
- 130005138953
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- NII書誌ID
- AA11448771
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- ISSN
- 13478400
- 13411756
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- NDL書誌ID
- 11077592
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可