書誌事項
- タイトル別名
-
- Initial Deposition Process of Polypyrrole on the Positively Charged Substrates by In Situ Polymerization Method
- in situ ジュウゴウホウ ニ ヨル セイ ニ カデン シタ キバン ジョウ エ ノ ポリピロール ショキ タイセキ カテイ
この論文をさがす
抄録
The surface treatment of glass substrates affects the in situ polymerization of pyrrole on them. Here, we have studied the initial deposition process for the positively charged substrates. It was found that no notable difference is induced by dipping the substrates in solutions containing one or two components of the in situ polymerization solution, prior to in situ polymerization. However, dipping in the in situ polymerization solution containing all three components, pyrrole, FeCl3 and p-toluenesolfonic acid sodium salt (PTSNa) removed the rest time. This fact implies that the polymerization reaction of pyrrole on the substrate is required to initiate the deposition of polypyrrole. It was also observed that photoelectron emission from the substrates for which the polymerization was quenched during the rest time, indicating the depositon of oligomerized or polymerized pyrrole on the substrates although the deposition could not be detected by the optical absorption spectra.
収録刊行物
-
- 電気学会論文誌. A
-
電気学会論文誌. A 123 (11), 1136-1140, 2003
一般社団法人 電気学会
- Tweet
詳細情報 詳細情報について
-
- CRID
- 1390001204593273600
-
- NII論文ID
- 10012555674
-
- NII書誌ID
- AN10136312
-
- ISSN
- 13475533
- 03854205
-
- NDL書誌ID
- 6751254
-
- 本文言語コード
- ja
-
- データソース種別
-
- JaLC
- NDL
- Crossref
- CiNii Articles
-
- 抄録ライセンスフラグ
- 使用不可