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- 今井 國治
- 名古屋大学医学部保健学科放射線技術科学専攻
書誌事項
- タイトル別名
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- Properties of PD Degradation/Breakdown in a Micro Gap with an Artificial Void Model
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説明
In this study, an artificial void model was made on the basis of the Whitehead abc model and time to breakdown of a PP film which formed the artificial void was investigated with the Weibull distribution. Voltage dependence of time to breakdown of the PP film (V-t characteristic) becomes discontinuous at a certain voltage between 12 and 13kV. Furthermore, repetition of the breakdown mechanism transition (fatigue-failure- type→ random-failure-type or early/random-failure- type) occurs at the certain voltage. These results suggest that patterns of surface discharge in the artificial void change from Polbüschel to Gleitbüschel.
収録刊行物
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- 電気学会論文誌． Ａ
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電気学会論文誌． Ａ 123 (8), 819-820, 2003
一般社団法人 電気学会
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詳細情報 詳細情報について
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- CRID
- 1390001204594739072
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- NII論文ID
- 10011450009
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- NII書誌ID
- AN10136312
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- ISSN
- 13475533
- 03854205
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
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- 抄録ライセンスフラグ
- 使用不可