書誌事項
- タイトル別名
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- Active Oxygen Generator by Silent Discharge and Oxidation Power in Formation of Oxide Thin Films
- ムセイ ホウデンシキ カッセイ サンソ ハッセイキ ト サンカ ハクマク ケイセイ ニ オケル サンカリョク
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抄録
We have studied the low pressure silent discharge type active oxygen generator in terms of the application to the formation of oxide thin films. In this paper the oxidation power of active oxygen in the oxide thin film formation is compared with that of oxygen and ozone by forming silicon oxide thin films. It was confirmed that the oxidation power is in turn of active oxygen > ozone > oxygen from the experimental result of the number of x in SiOx thin film. Furthermore we applied active oxygen to the formation of the thin film high temperature super conductor and active oxygen was found to be effective to the formation of the thin film with high performance.
収録刊行物
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- 電気学会論文誌． Ａ
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電気学会論文誌． Ａ 127 (2), 65-70, 2007
一般社団法人 電気学会
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詳細情報 詳細情報について
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- CRID
- 1390001204595085824
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- NII論文ID
- 10018480844
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- NII書誌ID
- AN10136312
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- ISSN
- 13475533
- 03854205
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- NDL書誌ID
- 8668263
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可
