Preparation and Characterization of BaTiO<sub>3</sub> Thin Films by Backside Pulsed Ion-Beam Evaporation
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- Sonegawa Tomihiro
- Nagaoka University of Technology
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- GRIGORIU Constantin
- Nagaoka University of Technology
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- Masugata Katsumi
- Nagaoka University of Technology
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- Yatsui Kiyoshi
- Nagaoka University of Technology
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- Shimotori Yutaka
- Nippon Seiki Co., Ltd.
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- Yamamoto Hirotsugu
- Nichicon Co., Ltd.
Bibliographic Information
- Other Title
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- 背面堆積パルスイオンビーム蒸着法によるBaTiO<sub>3</sub>薄膜の生成と特性評価
- 背面堆積パルスイオンビーム蒸着法によるBaTiO3薄膜の生成と特性評価
- ハイメン タイセキ パルス イオン ビーム ジョウチャクホウ ニヨル BaTi
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Abstract
Barium titanate (BaTiO3) thin films have been prepared in situ on Al/SiO2/Si(100) substrate by backside deposition of intense, pulsed, ion-beam evaporation technique using 1.3MeV, 50ns, 25J/cm2 ion beam. Very smooth surface of the films was obtained, where no droplets appear, The deposition rate was approximately 50nm/shot, which is-10% of the conventional frontside deposition. The films were perovskite polycrystals. The maximum roughness of the surface decreases from 60 to 35nm with increasing substrate temperature from 25 to 350°C, respectively The capacitance of the thin film (at 1kHz) increases from 3 to 10nF/mm2 with increasing substrate temperature from 25 to 250°C, respectively.
Journal
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- IEEJ Transactions on Fundamentals and Materials
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IEEJ Transactions on Fundamentals and Materials 117 (4), 398-404, 1997
The Institute of Electrical Engineers of Japan
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Details 詳細情報について
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- CRID
- 1390001204600608640
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- NII Article ID
- 130006840108
- 10002821720
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- NII Book ID
- AN10136312
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- ISSN
- 13475533
- 03854205
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- NDL BIB ID
- 4171851
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed