Micromachining of Silica Glass Using EUV Radiation of Laser-Produced Plasma
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- Takahashi Akihiko
- Department of Health Sciences, School of Medicine, Kyushu University
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- Torii Shuichi
- Institute of Applied Physics, University of Tsukuba
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- Makimura Tetsuya
- Institute of Applied Physics, University of Tsukuba
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- Murakami Kouichi
- Institute of Applied Physics, University of Tsukuba
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- Okazaki Kota
- Department of Health Sciences, School of Medicine, Kyushu University
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- Nakamura Daisuke
- Graduate School of Information Sciences and Electrical Engineering, Kyushu University
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- Okada Tatsuo
- Graduate School of Information Sciences and Electrical Engineering, Kyushu University
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- Niino Hiroyuki
- Photonic Research Institute, National Institute of Advanced Industrial Science and Technology
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Abstract
We are investigating the micromachining of silica glass using extreme ultraviolet (EUV) light from laser-produced plasma (LPP). The present investigation deals with the ablation using EUV light of around 13.5 nm and 11 nm generated in laser-produced Sn plasma and Xe plasma, respectively. CO2 laser and Nd:YAG lasers were used as pump lasers. The EUV radiation was focused on the surface of silica glass through the meshed mask using an ellipsoidal mirror coated with gold film. The results showed that the silica glass was successfully ablated by EUV light from the Nd:YAG-LPP. The maximum ablation rate was 42 nm per shot for 11-nm light, and 25 nm per shot for 13.5-nm light. On the other hand, EUV radiation from the CO2-LPP did not ablate the silica glass. This is presumably caused by the lower EUV irradiation intensity due to the long pulse duration of the CO2 laser.
Journal
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- IEEJ Transactions on Electronics, Information and Systems
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IEEJ Transactions on Electronics, Information and Systems 130 (10), 1779-1783, 2010
The Institute of Electrical Engineers of Japan
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Details 詳細情報について
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- CRID
- 1390001204608452224
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- NII Article ID
- 130000415111
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- NII Book ID
- AN10065950
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- ISSN
- 13488155
- 03854221
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- NDL BIB ID
- 10831962
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
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- CiNii Articles
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- Abstract License Flag
- Disallowed