シャドウマスクの磁界分布と電子軌道への影響

DOI DOI 被引用文献6件 オープンアクセス

書誌事項

タイトル別名
  • Magnetic field distribution of shadow mask and its influence on electron trajectory.

説明

It is well known that, in a color CRT, color change occurs due to the magnetization of a shadow mask and frame under the environmental magnetic field. In order to clarify the influence of the magnetization of a shadow mask and frame quantitatively, we measured the magnetic field distribution around the mask and frame, and calculated the electron beam trajectory change with a slit model to simulate a shadow mask. The results show that the remarkable change of the trajectory and velocity of electron beam occur in the slit region with the high magnetic flux density.

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被引用文献 (6)*注記

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詳細情報 詳細情報について

  • CRID
    1390001205089924480
  • NII論文ID
    130004477777
  • DOI
    10.3379/jmsjmag.14.403
    10.1109/tjmj.1991.4565178
  • COI
    1:CAS:528:DyaK3MXhtlCjt7Y%3D
  • ISSN
    18804004
    02850192
    08824959
  • 本文言語コード
    ja
  • データソース種別
    • JaLC
    • Crossref
    • CiNii Articles
    • OpenAIRE
  • 抄録ライセンスフラグ
    使用不可

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