書誌事項
- タイトル別名
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- Fabrication of Electret Using Soft X-ray Irradiation for Silicon Microphone
- ナンXセン ショウシャ ニ ヨル シリコンマイクロホンヨウ エレクトレット ノ サクセイ
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To develop an ultraminiature high-performance microphone for the next generation, we have been studying a silicon microphone. We previously fabricated a single-crystalline silicon microphone using original MEMS technology. The prototype microphone showed excellent acoustic characteristics such as high sensitivity and wide frequency range. Aiming at low-voltage operation, we have recently developed a novel electret charging technique using soft X-ray irradiation. This technique leads to removing the 48-V bias voltage. Experimental results show that an internal inorganic dielectric film keeps electric charges and has excellent heat resistance. This technique exhibits promise for developing a low-voltage operation silicon microphone for purposes ranging from broadcasting to consumer use.
収録刊行物
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- 映像情報メディア学会誌
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映像情報メディア学会誌 64 (7), 1003-1006, 2010
一般社団法人 映像情報メディア学会
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詳細情報 詳細情報について
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- CRID
- 1390001205126557312
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- NII論文ID
- 10030702362
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- NII書誌ID
- AN10588970
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- ISSN
- 18816908
- 13426907
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- NDL書誌ID
- 10763043
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
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- 使用不可