書誌事項
- タイトル別名
-
- Numerical Analysis of Deposition Rates of Zirconium Thin Films by Thermal Chemical Vapor Deposition
- ネツ CVDホウ ニ ヨル ジルコニア マク ゴウセイジ ノ タイセキ ソクド
この論文をさがす
抄録
Zirconia films were prepared by the CVD method using thermal decomposition of zirconium-tetra-i-propoxide with He gas under 20kPa. The films on the substrate consisted of fine particles less than 1μm and were metastable tetragonal-zirconia. The maximum deposition rate was 6nm/s at 673K and a reactant gas concentration of 0.05mol%. The profile of deposition rate was calculated using a simplified reaction and coagulation model. The calculated results showed a good agreement with the experimental data under the operating conditions of 673K and 0.07mol%. Deposition rates for the system used are estimated with this model.
収録刊行物
-
- Journal of the Ceramic Society of Japan (日本セラミックス協会学術論文誌)
-
Journal of the Ceramic Society of Japan (日本セラミックス協会学術論文誌) 100 (1159), 266-271, 1992
公益社団法人 日本セラミックス協会
- Tweet
キーワード
詳細情報 詳細情報について
-
- CRID
- 1390001205278726400
-
- NII論文ID
- 110002290170
-
- NII書誌ID
- AA12312210
-
- ISSN
- 18821022
- 09145400
-
- NDL書誌ID
- 3758289
-
- データソース種別
-
- JaLC
- IRDB
- NDL
- Crossref
- CiNii Articles
-
- 抄録ライセンスフラグ
- 使用不可