Deposition and wear resistance of composite TiBC-SiC coatings on Si wafer by thermal plasma CVD
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- SHIMADA Shiro
- Graduate School of Engineering, Hokkaido University
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- FUJI Yusuke
- Graduate School of Engineering, Hokkaido University
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- KIYONO Hajime
- Graduate School of Engineering, Hokkaido University
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- TSUJINO Jiro
- Research & Development Department, Hokkaido Electric Power Co., Ltd.
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- YAMAZAKI Isao
- Hokkaido Sumiden Precision Industries Ltd.
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Composite TiBC-SiC film coatings with various contents of SiC were deposited on Si wafer at 800°C from a mixed solution of titanium tetra-ethoxide, boron tri-ethoxide and/or hexa-methyl-disiloxane by an Ar/H2 thermal plasma CVD. The crystalline phases (TiB2, TiC, SiC) in the coatings are identified by thin film grazing incidence X-ray diffraction. The surfaces and cross-sections of the monolithic TiBC and SiC and composite TiBC-SiC coatings are observed by scanning electron microscopy. The microstructure of a cross-section of composite TiBC-55 mol% SiC film is observed by transmission electron microscopy with EDX analysis. The wear rates of the composite TiBC-SiC film are evaluated from cross-sectional profiles of the residual wear tracks formed by ball-on-disk wear tests using SUS and alumina balls with their results correlated with the SiC content and film hardness.
収録刊行物
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- Journal of the Ceramic Society of Japan
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Journal of the Ceramic Society of Japan 117 (1364), 415-420, 2009
公益社団法人 日本セラミックス協会
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詳細情報 詳細情報について
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- CRID
- 1390001205283127808
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- NII論文ID
- 10025966864
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- NII書誌ID
- AA12229489
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- ISSN
- 13486535
- 18820743
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- NDL書誌ID
- 10198244
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
- KAKEN
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- 抄録ライセンスフラグ
- 使用不可