高感度光重合開始系の最近の進歩

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  • 青合 利明
    富士フイルム株式会社R&D統括本部有機合成化学研究所

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タイトル別名
  • Recent Progress of Highly Sensitive Photo-Polymerization Initiation
  • コウカンド ヒカリ ジュウゴウ カイシケイ ノ サイキン ノ シンポ

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A photopolymer material has been widely used in negative-type photosensitive composition (e.g. as a radical or an acid catalyzed polymerization). A large number of photo-initiator com-pounds for these compositions have been developed corresponding to many industrial demands such as coatings (overcoats, adhesives), graphic materials (printing plates, inks), electronic materi-als (printed circuit, micro-resist, color filter), and recording materials (holography). With recent development of light source especially for IR, Visible, and UV lasers, there is a growing interest to increase their photo-sensitivity. To perform much higher sensitivity, dye sensitizers are usually utilized in both radical and cationic photo-polymerization, and are elaborately designed in combi-nation of initiators. The dye sensitization is mainly classified into 1) electron transfer mechanism and 2) energy transfer mechanism. The dyes, therefore, are controlled and adjusted to their physi-cal properties such as wave length, redox potential, and excited energy level according to the mechanism. In this paper, the classification of these initiators/dye sensitizers and their character-istics are shortly described. Furthermore a few recent applications are introduced as an example of high sensitive material.

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