In-situ analysis of the deuteration behavior of Si-OH groups on silica materials by DRIFTS

Bibliographic Information

Other Title
  • 拡散反射法FT-IRによるシリカSi-OH基の重水素化反応挙動のその場観察

Description

It is well known that the Si-OH groups on the amorphous silica are converted into the Si-OD groups under a high temperature deuterium atmosphere. To investigate the deuteration behavior of the silica materials, we tried the in situ FT-IR measurement by using of DRIFTS technique. From these attempts, it is revealed that the conversion rate of the Si-OH(D) groups on the cobalt-doped silica is considerably higher than that of the non-doped silica. These features in the deuteration behavior could be strongly related to the chemical situations of the Si-OH(D) groups on the silica materials

Journal

Details 詳細情報について

  • CRID
    1390001205617367424
  • NII Article ID
    130006975265
  • DOI
    10.14853/pcersj.2009f.0.2h01.0
  • Text Lang
    ja
  • Data Source
    • JaLC
    • CiNii Articles
  • Abstract License Flag
    Disallowed

Report a problem

Back to top