10111 様々な膜種の半導体ウェーハに付着した液滴の蒸発モデル

DOI Web Site

書誌事項

タイトル別名
  • 10111 Droplet evaporation model on various film surface of Si wafers

抄録

The droplet evaporation process was categorized into two types, i.e. constant contact radius (CCR) and constant contact angle (CCA) types. The present study was aimed to construct the mathematical model to describe the droplet evaporation phenomena for CCR and CCA types. The mathematical model was developed by considering evaporation phenomena at the droplet edge. The change of droplet volumes predicted by the mathematical model were compared with the experimental data of droplet evaporation of Cu, Low-k, and Th-Ox wafers. As a result, it was confirmed that the result of developed model was in agreement with the experimental data.

収録刊行物

キーワード

詳細情報 詳細情報について

問題の指摘

ページトップへ