301 High-speed formation of compound semiconductors using in-liquid plasma chemical vapor deposition
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- Toyota Hiromichi
- Ehime University
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- Baba Tatsuya
- Ehime University
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- Nomura Shinfuku
- Ehime University
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- Mukasa Shinobu
- Ehime University
Bibliographic Information
- Other Title
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- 301 液中プラズマ化学蒸着における化合物半導体の高速形成(機械材料・材料加工I)
Journal
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- The Proceedings of Conference of Chugoku-Shikoku Branch
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The Proceedings of Conference of Chugoku-Shikoku Branch 2012.50 (0), 30101-30102, 2012
The Japan Society of Mechanical Engineers
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Keywords
Details 詳細情報について
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- CRID
- 1390001205860458368
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- NII Article ID
- 110009913695
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- ISSN
- 24242764
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- Text Lang
- ja
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- Data Source
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- JaLC
- Crossref
- CiNii Articles
- OpenAIRE
