Fabrication Technology of Autocloning for Photonic Crystals (<Special Issue>Photonic Crystals)

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  • フォトニック結晶の自己クローニング法による作製技術(<小特集>フォトニック結晶)
  • フォトニック結晶の自己クローニソグ法による作製技術
  • フォトニック ケッショウ ノ ジコ クローニソグホウ ニ ヨル サクセイ ギジュツ

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Abstract

Autocloning is a reliable fabrication method for photonic crystals, which is based on stacking multilayers by sputter deposition and shaping by sputter etching. For we increase the freedom of the shaping process for unit cells ofthe autocloned photonic crystals, we have developed a new fabrication process by introducing reactive ion etching into autocloning. Utilizing the new process, we can fabricate a non layer-by-layer structure unlike usual autocloned structures. The new process leads to the development of new structures and new possibilities of autocloning. In this paper, we report the details of the process, the new structures, and its applications.

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