書誌事項
- タイトル別名
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- Fabrication Technology of Autocloning for Photonic Crystals (<Special Issue>Photonic Crystals)
- フォトニック結晶の自己クローニソグ法による作製技術
- フォトニック ケッショウ ノ ジコ クローニソグホウ ニ ヨル サクセイ ギジュツ
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抄録
Autocloning is a reliable fabrication method for photonic crystals, which is based on stacking multilayers by sputter deposition and shaping by sputter etching. For we increase the freedom of the shaping process for unit cells ofthe autocloned photonic crystals, we have developed a new fabrication process by introducing reactive ion etching into autocloning. Utilizing the new process, we can fabricate a non layer-by-layer structure unlike usual autocloned structures. The new process leads to the development of new structures and new possibilities of autocloning. In this paper, we report the details of the process, the new structures, and its applications.
収録刊行物
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- 日本結晶成長学会誌
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日本結晶成長学会誌 28 (1), 13-18, 2001
日本結晶成長学会
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詳細情報 詳細情報について
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- CRID
- 1390001205862587008
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- NII論文ID
- 110002715447
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- NII書誌ID
- AN00188386
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- ISSN
- 21878366
- 03856275
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- NDL書誌ID
- 5726897
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可