Atomic Layer Deposition of TiN Films by Alternate Supply of Tetrakis(ethylmethylamino)-Titanium and Ammonia.
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- Min Jae–Sik
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, 373–1 Kusong–dong, Yusong–ku, Taejon, Korea
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- Son Young–Woong
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, 373–1 Kusong–dong, Yusong–ku, Taejon, Korea
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- Kang Won–Gu
- GeniTech. Inc., 106–5 Eoeun–dong, Yusong–gu, Taejon, Korea
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- Chun Soung–Soon
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, 373–1 Kusong–dong, Yusong–ku, Taejon, Korea
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- Kang Sang–Won
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, 373–1 Kusong–dong, Yusong–ku, Taejon, Korea
Description
Atomic layer deposition (ALD) of amorphous TiN films on SiO2 between 170°C and 210°C has been investigated by alternate supply of reactant sources, Ti[N(C2H5CH3)2]4 [tetrakis(ethylmethylamino)titanium:TEMAT] and NH3. Reactant sources were injected into the reactor in the following order:TEMAT vapor pulse, Ar gas pulse, NH3 gas pulse and Ar gas pulse. Film thickness per cycle was saturated at around 1.6 monolayers (ML) per cycle with sufficient pulse times of reactant sources at 200°C. The results suggest that film thickness per cycle could exceed 1 ML/cycle in ALD, and are explained by the rechemisorption mechanism of the reactant sources. An ideal linear relationship between number of cycles and film thickness is confirmed. As a result of surface limited reactions of ALD, step coverage was excellent. Particles caused by the gas phase reactions between TEMAT and NH3 were almost absent because TEMAT was segregated from NH3 by the Ar pulse. In spite of relatively low substrate temperature, carbon impurity was incorporated below 4 at.%.
Journal
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 37 (9A), 4999-5004, 1998
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390001206250432128
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- NII Article ID
- 130004525231
- 210000043643
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- ISSN
- 13474065
- 00214922
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- Text Lang
- en
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- Data Source
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- JaLC
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed