Atomic Resolution Imaging on Si(100)2 * 1 and Si(100)2 * 1 : H Surfaces with Noncontact Atomic Force Microscopy.
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- Yokoyama Kousuke
- Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan
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- Ochi Taketoshi
- Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan
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- Yoshimoto Akira
- Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan
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- Sugawara Yasuhiro
- Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan
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- Morita Seizo
- Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan
Bibliographic Information
- Other Title
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- Atomic Resolution Imaging on Si(100)2×1 and Si(100)2×1:H Surfaces with Noncontact Atomic Force Microscopy
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Abstract
We investigate the difference in atomic resolution images between the Si(100)2 × 1 reconstructed surface with a dangling bond and the Si(100)2 × 1:H monohydride surface without a dangling bond using noncontact atomic force microscopy. On the Si(100)2 × 1 surface, the distance between bright spots is 3.2 ± 0.1 Å, which is larger than that between silicon atoms. On the Si(100)2 × 1:H surface, the distance between bright spots is 3.5 ± 0.1 Å, which is in good agreement with that between hydrogen atoms. For the first time, individual hydrogen atoms are resolved. This means that the distance between measured bright spots forming dimers is increased by the hydrogen termination.
Journal
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 39 (2A), L113-L115, 2000
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390001206252128768
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- NII Article ID
- 210000048308
- 110003928694
- 130004527033
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- NII Book ID
- AA10650595
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- COI
- 1:CAS:528:DC%2BD3cXhtlSqu78%3D
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- ISSN
- 13474065
- 00214922
- http://id.crossref.org/issn/00214922
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- NDL BIB ID
- 4986336
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed