Direct Measurement of Sheath Electric Field Distribution in Front of Substrate in Electron Cyclotron Resonance Plasma by Laser-Induced Fluorescence Technique.

DOI Web Site Web Site Web Site 被引用文献1件 参考文献11件
  • Watanabe Mahiko
    Department of Applied Physics and Chemistry, Faculty of Engineering, Hiroshima University,<BR> 1-4-1, Kagamiyama, Higashi-Hiroshima 739-8527, Japan
  • Takiyama Ken
    Department of Applied Physics and Chemistry, Faculty of Engineering, Hiroshima University,<BR> 1-4-1, Kagamiyama, Higashi-Hiroshima 739-8527, Japan
  • Oda Toshiatsu
    Faculty of Engineering, Hiroshima Kokusai Gakuin University, Nakano, Aki-ku, Hiroshima 739-0321, Japan

この論文をさがす

抄録

The first reported direct measurement of a sheath electric field structure was made in front of a substrate in an electron cyclotron resonance plasma flow in a magnetic field using polarized laser-induced fluorescence spectroscopy. A linear decrease of the electric field strength was found relative to the distance from the substrate surface. The sheath thickness was proportional to the square root of the applied bias voltage. The experimental results can be explained by a simple sheath model.

収録刊行物

被引用文献 (1)*注記

もっと見る

参考文献 (11)*注記

もっと見る

キーワード

詳細情報 詳細情報について

問題の指摘

ページトップへ