An Innovative Method for Contact Hole Printing with Binary Mask and Single Exposure
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- Yamazoe Kenji
- Optics Technology Research Center, Canon Inc.
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- Saitoh Kenji
- Optics Technology Research Center, Canon Inc.
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- Suzuki Akiyoshi
- Optics Technology Research Center, Canon Inc.
書誌事項
- タイトル別名
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- Innovative Method for Contact Hole Printing with Binary Mask and Single Exposure
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説明
We have introduced a new method for fine contact hole printing using a specially designed binary mask and modified illumination in a single exposure, which can realize k1=0.3 lithography. The binary mask has periodic assist holes around the main holes and the illumination is the combination of strong and weak off-axis parts. Conventionally, assist holes are placed in longitudinal and lateral directions around the main holes or 45° to the main pattern. In this paper, we will show that a new kind of assist hole configuration can be applied to this method and that the new configuration has better imaging characteristics in some cases. Since these three configurations can be utilized with the same illumination, a combination of these configurations in the same mask leads to a wider application of this method because conflicting patterns are avoided.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 43 (6B), 3653-3662, 2004
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390001206264106624
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- NII論文ID
- 10013275496
- 130004532255
- 210000055748
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- NII書誌ID
- AA10457675
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- ISSN
- 13474065
- 00214922
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- NDL書誌ID
- 6996238
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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