Growth of Carbon Nanowalls on a SiO<sub>2</sub> Substrate by Microwave Plasma-Enhanced Chemical Vapor Deposition
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- Tanaka Kei
- Nano High-Tech Research Center, Toyota Technological Institute
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- Yoshimura Masamichi
- Nano High-Tech Research Center, Toyota Technological Institute
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- Okamoto Atsuto
- Toyota Central R&D Lab., Inc.
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- Ueda Kazuyuki
- Nano High-Tech Research Center, Toyota Technological Institute
書誌事項
- タイトル別名
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- Growth of Carbon Nanowalls on a SiO2 Substrate by Microwave Plasma-Enhanced Chemical Vapor Deposition
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We investigated the growth process of carbon nanowalls (CNWs) on a SiO2 substrate by microwave plasma-enhanced chemical vapor deposition (MPECVD). It is revealed that the CNWs are grown at the fine-textured structure on the SiO2 and the growth process does not require the catalyst. The CNW initially has a semicircular shape. The height, thickness, and mesh size increase with growth time. It is found that the height of CNWs as a function of time obeys the square root law. Extremely high growth rate, approximately 10 μm/h, is achieved, in contrast to previous studies.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 44 (4A), 2074-2076, 2005
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390001206264234368
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- NII論文ID
- 10015471393
- 210000057655
- 130004533649
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- NII書誌ID
- AA10457675
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- COI
- 1:CAS:528:DC%2BD2MXktFSltLw%3D
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- ISSN
- 13474065
- 00214922
- http://id.crossref.org/issn/13474065
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- NDL書誌ID
- 7302999
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可