書誌事項
- タイトル別名
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- Ostwald Ripening of Si Precipitates in Al-Si Alloys
- Al Si ゴウキン ニ オケル Si セキシュツブツ リュウシ ノ オストワ
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抄録
The coarsening behavior of Si precipitates in Al-Si alloys containing 0.60, 0.90 and 1.19wt% Si was studied electron microscopically. The coarsening data of the alloys aged at 573 to 773K were analyzed on the basis of the Lifshiz-Wagner theory on diffusion-controlled coarsening. The coarsening kinetics of the Si precipitates follows the time-law predictions of the theory at all ageing temperatures. The particle-size distribution of the Si precipitates is significantly broader than the theoretical one. The activation energy for the Ostwald ripening and the particle matrix interfacial free energy were determined.
収録刊行物
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- 軽金属
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軽金属 29 (8), 322-330, 1979
一般社団法人 軽金属学会
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詳細情報 詳細情報について
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- CRID
- 1390001206340515456
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- NII論文ID
- 130004075548
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- NII書誌ID
- AN00069773
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- COI
- 1:CAS:528:DyaL3cXpsl2nsA%3D%3D
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- ISSN
- 18808018
- 04515994
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- NDL書誌ID
- 2059868
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可