Performance Improvement of Semiconductor Lithograph Machine Using Active Mass Damper System(Mechanical Systems)
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- TAKAHASHI Masato
- Nikon Corporation Precision Equipment Company Development Headquarters
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- WAKUI Shinji
- 東京農工大学大学院共生科学技術研究院
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- MAKINOUCHI Susumu
- Nikon Corporation Precision Equipment Company Development Headquarters
Bibliographic Information
- Other Title
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- アクティブマスダンパによる露光装置の性能改善(機械力学,計測,自動制御)
- アクティブマスダンパによる露光装置の性能改善
- アクティブマスダンパ ニ ヨル ロコウ ソウチ ノ セイノウ カイゼン
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Abstract
In the field of ultra precise positioning, such as semiconductor lithograph machine, an active isolation system is generally installed. In a present lithograph manufacturing machine, the scanning type is a main current, furthermore the main structure supported projection lens is separated from wafer stage which can be freely moved in the stage stroke, and the stage is supported by independent isolation system on the base. When wafer stage move, its reaction force is caught by mechanical supported structure (reaction frame) to avoid exciting the surface plate of the wafer stage. At this time, reaction frame is vibrating due to its natural frequency, and this remaining vibration transfer to surface plate directly or through floor. Still more the accuracy of the machine get worse. In this paper, when wafer stage moved and its reaction force excite the reaction frame, it is introduced that the improvement of vibration reduction method by using active mass damper. Eventually it is able to improve the enough performance for vibration disturbance.
Journal
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- TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series C
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TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series C 76 (772), 3350-3356, 2010
The Japan Society of Mechanical Engineers
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Details 詳細情報について
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- CRID
- 1390001206388273280
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- NII Article ID
- 110008006842
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- NII Book ID
- AN00187463
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- ISSN
- 18848354
- 03875024
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- NDL BIB ID
- 10939101
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed