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- VAN CAPPELLEN Eric
- FEI Company USA
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- BRIGHT Alex
- 日本エフイー・アイ株式会社
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- JINSCHEK Joerg R.
- FEI Company Netherlands
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- 伊野家 浩司
- 日本エフイー・アイ株式会社
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- FREITAG Bert
- FEI Company Netherlands
書誌事項
- タイトル別名
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- Spherical Aberration Correction in TEM
- キュウメン シュウサ ホセイ TEM オ チュウシン ト スル ギジュツ
この論文をさがす
抄録
Although developed to improve spatial resolution, a TEM spherical aberration corrector or ‘image corrector’ has the added benefit of eliminating the artifact of delocalization in HR-TEM imaging. This greatly increases the power of HRTEM imaging and is especially important for clear imaging of surfaces and interfaces. When such a corrector is combined with a source monochromator, ultra high resolution at low accelerating voltages also becomes feasible. These technologies can also be added to an environmental TEM (ETEM) to achieve unprecedented resolution on TEM samples in gaseous environments. Some recent results illustrating the power of image corrected TEM and how it is being used at the cutting edge of materials science are presented.
収録刊行物
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- 表面科学
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表面科学 34 (5), 234-239, 2013
公益社団法人 日本表面科学会
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詳細情報 詳細情報について
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- CRID
- 1390001206457808128
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- NII論文ID
- 10031170836
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- NII書誌ID
- AN00334149
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- COI
- 1:CAS:528:DC%2BC3sXhsFSktr%2FI
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- ISSN
- 18814743
- 03885321
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- NDL書誌ID
- 024664147
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可