Present and Future of Research on Plasma Processing of Nanomaterials
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- SHIRATANI Masaharu
- Kyushu University
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- KOGA Kazunori
- Kyushu University
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- UCHIDA Giichiro
- Osaka University
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- SEO Hyunwoong
- Kyushu University
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- ITAGAKI Naho
- Kyushu University
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- IWASHITA Shinya
- Kyushu University
Bibliographic Information
- Other Title
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- ナノ材料のプラズマプロセシングの研究の現状と将来
- ナノ ザイリョウ ノ プラズマプロセシング ノ ケンキュウ ノ ゲンジョウ ト ショウライ
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Abstract
This paper reviews production of nanoparticles using low pressure reactive plasmas and its application to quantum dot sensitized solar cells. For the method, nanoparticles of several nm in size with a small size dispersion are produced in gas phase using reactive plasmas, and then the nanoparticles and radicals are co-deposited on a substrate. This method realizes one-step deposition of nanoparticle composite films in a controllable way.
Journal
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- Hyomen Kagaku
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Hyomen Kagaku 34 (10), 520-527, 2013
The Surface Science Society of Japan
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Details 詳細情報について
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- CRID
- 1390001206459039104
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- NII Article ID
- 10031202795
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- NII Book ID
- AN00334149
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- ISSN
- 18814743
- 03885321
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- NDL BIB ID
- 024936948
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed