書誌事項
- タイトル別名
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- Sm-Fe Thin Film Prepared by Reactive Sputtering Process
抄録
Sm-Fe thin films as giant magnetostrictive materials were prepared by d.c. magnetron sputtering process with Ar or mixed N2-Ar sputtering gas. In X-ray diffraction patterns of the film prepared by 2.3 vol% N2-Ar as sputtering gas, diffraction peaks of SmN and Fe2N where observed. With increasing N2 gas amount, saturated magnetostriction of the Sm-Fe thin films decreased from 1400 ppm to 600 ppm. The maximum value of magnetostrictive susceptibility was showed at the film prepared by 1.0 vol% of N2-Ar gas. The film prepared by pure Ar gas showed compressive stress with 0.5 GPa. Sm-Fe thin films prepared by mixed N2-Ar gas showed about 0.7 GPa of compressive stress. Increasing of magnetostrictive susceptibility of films prepared by N2-Ar gas due to reduce of perpendicular magnetic anisotropy energy.<br>
収録刊行物
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- 日本金属学会誌
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日本金属学会誌 70 (8), 615-617, 2006
公益社団法人 日本金属学会
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詳細情報 詳細情報について
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- CRID
- 1390001206477039616
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- NII論文ID
- 130004455732
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- ISSN
- 18806880
- 24337501
- 00214876
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可