書誌事項
- タイトル別名
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- Spectrochemical Determination of Trace amount of Vanadium and Silicon in Titanium Tetrachloride by the Addition Method. (Application of Quantitative Spectrochemical Analysis to Titanium Refining Industry (2nd Report))
- 添加法によるTiCl4中の微量VおよびSiの定量分光分析について
- テンカホウ ニ ヨル TiCl4 チュウ ノ ビリョウ V オヨビ Si ノ テイリョウ ブンコウ ブンセキ ニ ツイテ
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With the demand of high purity titanium sponge, the minut amounts of impurities in titanium tetrachloride have become of great significance to the titanium refining industry because small amounts of vanadium in titanium tetrachloride present as VOCl3 are deleterious to Brinell hardness of titanium metal. A spectrochemical addition method for determining V and Si covering the concentration ranges of 0.008 to 0.0008% and 0.001 to 0.0002% in titanium tetrachloride respectively, is developed. Based on statistical consideration, the optimum intensity ratio, the selection of back-ground radiation and precision of this spectrochemical addition maked are discussed. Except the intensity ratio measurement and the preparation of analytical addition curve, the excitation condition and the photographic procedures are identical with those described in our previous report.
収録刊行物
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- 日本金属学会誌
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日本金属学会誌 23 (2), 86-90, 1959
公益社団法人 日本金属学会
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詳細情報 詳細情報について
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- CRID
- 1390001206482110080
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- NII論文ID
- 130007333758
- 40018257380
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- NII書誌ID
- AN00187860
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- ISSN
- 18806880
- 24337501
- 00214876
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- NDL書誌ID
- 9152820
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- データソース種別
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- JaLC
- NDL
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