Application of Atomic Absorption Analysis to Impurity Diffusion of Copper in Nickel in a Wide Range of Temperature
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- Taguchi Osamu
- Miyagi Technical College
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- Iijima Yoshiaki
- Department of Materials Science, Faculty of Engineering, Tohoku University
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- Hirano Ken-ichi
- Department of Materials Science, Faculty of Engineering, Tohoku University
Bibliographic Information
- Other Title
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- 原子吸光分析法による広い温度範囲におけるNi中のCuの不純物拡散の測定
- ゲンシ キュウコウ ブンセキホウ ニ ヨル ヒロイ オンド ハンイ ニ オケル
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Abstract
Atomic absorption analysis has been used to study the impurity diffusion of copper in nickel in the temperature range between 1080 and 1613 K. The linear Arrhenius plot of the impurity diffusion coefficient of Cu in Ni has been expressed as follows:<BR>(This article is not displayable. Please see full text pdf.) <BR>\oindentAtomic absorption analysis is found to be useful to measure the penetration profile for the impurity diffusion in metals where suitable radioisotope as a tracer is unavailable or the half-life of radioisotope is very short.
Journal
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- Journal of the Japan Institute of Metals and Materials
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Journal of the Japan Institute of Metals and Materials 48 (1), 20-24, 1984
The Japan Institute of Metals and Materials
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Keywords
Details 詳細情報について
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- CRID
- 1390001206485270656
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- NII Article ID
- 40002875732
- 130007338713
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- NII Book ID
- AN00187860
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- ISSN
- 18806880
- 24337501
- 00214876
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- NDL BIB ID
- 2974226
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed
