ワット浴より電析されたNi膜の微細構造

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タイトル別名
  • Microstructure of Ni Film Electroplated from a Watts Bath
  • ワットヨク ヨリ デンセキサレタ Ni マク ノ ビサイ コウゾウ

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The cross-sectional microstructure of the Ni film electroplated from a Watts type bath was observed by transmission electron microscopy in detail and the formation process of a layered structure which had been observed sometimes in the cross-section of the film was discussed. It was found that the layered structure is the alternate structure of large crystal layers and small crystal layers. The reason for the formation of the layered structure is related to the bubbles of hydrogen evoluted at higher current density plating. Namely, when the evoluted hydrogen bubbles rise along the cathode surface, a diffusion layer on the cathode surface is agitated by the bubbles, and then the Ni atoms are deposited and plating is carried out without existence of a diffusion layer. At this time, the large crystal layer is formed. But, after a short time, the diffusion layer is formed again and the deposition of atoms takes place through the diffusion layer. At this time the small crystal layer is formed. The formation of the layered structure observed in the cross-section of the Ni plating film results from alternate occurrence of this behavior in accordance with the chemical reaction change on the Ni plating.<BR>The crystallographic relationship between the deposited Ni film and the Cu substrate is also discussed.

収録刊行物

  • 日本金属学会誌

    日本金属学会誌 58 (2), 132-137, 1994

    公益社団法人 日本金属学会

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