電気化学的に処理したTiAl基合金表面に形成される水素化物の昇温水素脱離特性

書誌事項

タイトル別名
  • Thermal Hydrogen Desorption Spectroscopy of Hydrides Formed in the Surface Layer of an Electrochemically Treated TiAl Based Alloy
  • デンキ カガクテキ ニ ショリシタ TiAlキ ゴウキン ヒョウメン ニ ケイ

この論文をさがす

説明

Decomposition of hydrides formed in the surface layer of a TiAl-based alloy by an electrochemical treatment in sulfuric acid solution was studied by thermal desorption spectroscopy (TDS) combined with quadrupole mass spectroscopy (QMS), and X-ray diffractometry (XRD).<BR>Two peaks in the TDS curve and the results of QMS supported the presence of two hydrides in the alloy which was suggested by a previous study. XRD showed that the tetragonal hydride decomposed at 400 K corresponds to the first peak in TDS curve and the hexagonal hydride decomposed at 500 K corresponds to the second peak. The lattice parameters of the tetragonal hydride are a=0.455 nm and c=0.463 nm and these of the hexagonal hydride are a=0.523 nm and c=0.448 nm. The reason why two hydrides were formed is discussed.

収録刊行物

  • 日本金属学会誌

    日本金属学会誌 61 (2), 105-112, 1997

    公益社団法人 日本金属学会

参考文献 (9)*注記

もっと見る

詳細情報 詳細情報について

問題の指摘

ページトップへ