Capacitance Measurements of MnO<sub>X</sub> Films Deposited by Reactive Sputtering of a Mn Target

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  • LIN Chuen-Chang
    Department of Chemical & Materials Engineering, National Yunlin University of Science and Technology
  • LIN Peng-Yu
    Department of Chemical & Materials Engineering, National Yunlin University of Science and Technology

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  • Capacitance measurements of MnOx films deposited by reactive sputtering of a Mn target

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Description

Manganese oxide thin films are deposited on graphite foils by a dry process, one step reactive radio frequency (RF) magnetron sputtering with different volume flow rates of oxygen and sputtering time. Maximum mass specific capacitance of 320.26 F g−1 is obtained in 0.5 M LiCl as well as with optimum sputtering conditions [volume flow rate of oxygen=10 sccm (cm3 min−1) and sputtering time=60 min], and this demonstrates its good mass specific capacitance at a sweep rate of 100 mV s−1. Furthermore, the mass specific capacitance and the geometric specific capacitance increase at lower volume flow rates of oxygen, but decrease at higher volume flow rates of oxygen. Moreover, the electrochemical stability of the electrode increases with increasing sputtering time.

Journal

  • Electrochemistry

    Electrochemistry 79 (6), 458-463, 2011

    The Electrochemical Society of Japan

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