Capacitance measurements of MnOx films deposited by reactive sputtering of a Mn target
-
- LIN Chuen-Chang
- Department of Chemical & Materials Engineering, National Yunlin University of Science and Technology
-
- LIN Peng-Yu
- Department of Chemical & Materials Engineering, National Yunlin University of Science and Technology
書誌事項
- タイトル別名
-
- Capacitance Measurements of MnO<sub>X</sub> Films Deposited by Reactive Sputtering of a Mn Target
この論文をさがす
説明
Manganese oxide thin films are deposited on graphite foils by a dry process, one step reactive radio frequency (RF) magnetron sputtering with different volume flow rates of oxygen and sputtering time. Maximum mass specific capacitance of 320.26 F g−1 is obtained in 0.5 M LiCl as well as with optimum sputtering conditions [volume flow rate of oxygen=10 sccm (cm3 min−1) and sputtering time=60 min], and this demonstrates its good mass specific capacitance at a sweep rate of 100 mV s−1. Furthermore, the mass specific capacitance and the geometric specific capacitance increase at lower volume flow rates of oxygen, but decrease at higher volume flow rates of oxygen. Moreover, the electrochemical stability of the electrode increases with increasing sputtering time.
収録刊行物
-
- Electrochemistry
-
Electrochemistry 79 (6), 458-463, 2011
公益社団法人 電気化学会
- Tweet
詳細情報 詳細情報について
-
- CRID
- 1390001206497405184
-
- NII論文ID
- 10028111907
-
- NII書誌ID
- AN00151637
-
- COI
- 1:CAS:528:DC%2BC3MXnsFOqu78%3D
-
- ISSN
- 21862451
- 13443542
-
- NDL書誌ID
- 11095335
-
- 本文言語コード
- en
-
- データソース種別
-
- JaLC
- NDL
- Crossref
- CiNii Articles
-
- 抄録ライセンスフラグ
- 使用可