Vacuum evaporation and sputtering: introduction to thin film preparation

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  • ISHII Kiyoshi
    Electrical and Electronic Systems Engineering, The Graduate School of Engineering, Utsunomiya University

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Other Title
  • 薄膜作製のイロハ，真空蒸着法とスパッタリング法
  • 今さら聞けない? 基礎中の基礎 薄膜作製のイロハ,真空蒸着法とスパッタリング法
  • イマサラ キケナイ キソ チュウ ノ キソ ハクマク サクセイ ノ イロハ シンクウ ジョウチャクホウ ト スパッタリングホウ

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<p>A thin film is a layer of materials ranging from fractions of 1×10-9 m to 1×10-5 m in thickness. Electronic semiconductor devices, optical coatings and various surface modifications are the applications benefiting from thin film construction. The two most important technologies for the deposition of thin films are vacuum evaporation and sputtering. In this article, the deposition processes in them are described at the introductory level to explain fundamental concepts to untrained students and people.</p>

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  • Oyo Buturi

    Oyo Buturi 80 (7), 626-630, 2011-07-10

    The Japan Society of Applied Physics

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