Paramagnetic point defects in silicon nitride films annealed at 1050℃(Ⅱ)
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- Yamaguchi Shinji
- Tokai Univ.
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- Kobayashi Kiyoteru
- Tokai Univ.
Bibliographic Information
- Other Title
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- 1050℃熱処理において生成したシリコン窒化膜の常磁性欠陥（Ⅱ）
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2018.2 (0), 2837-2837, 2018-09-05
The Japan Society of Applied Physics
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Keywords
Details 詳細情報について
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- CRID
- 1390011959361412480
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC