Deposition and characterization of silicon dioxide film formed by surface-wave plasma enhanced chemical vapor deposition
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- Baba Makoto
- Toyohashi Univ.Tech
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- Yutaka Kondo
- Toyohashi Univ.Tech
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- Hiroshi Okada
- Toyohashi Univ.Tech EIIRIS
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- Masakazu Furukawa
- ARLC
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- Keisuke Yamane
- Toyohashi Univ.Tech
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- Hiroto Sekiguchi
- Toyohashi Univ.Tech
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- Akihiro Wakahara
- Toyohashi Univ.Tech EIIRIS
Bibliographic Information
- Other Title
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- 表面波プラズマ励起化学気相堆積法によるシリコン酸化膜の堆積と評価
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2017.1 (0), 3150-3150, 2017-03-01
The Japan Society of Applied Physics
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Keywords
Details 詳細情報について
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- CRID
- 1390012711638170880
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC