Study on factors affecting wafer actions during double-sided lapping
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- SUWABE Hitoshi
- Kanazawa Institute of Technology
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- KAMIMURA Takuya
- Kanazawa Institute of Technology graduate school
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- ISHIKAWA Ken-ichi
- Kanazawa Institute of Technology
Bibliographic Information
- Other Title
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- 両面ラッピング加工中のウェーハ挙動に影響を与える因子に関する研究
Abstract
<p>Wafer actions cannot be observed in 4-way lapping because the carrier and wafer are sandwiched between the upper and lower plates. Therefore, the factors that affect the wafer actions during processing are unclear. In this study, the wafer actions were observed using an acrylic plate in place of the upper plate in a 4-way lapping machine. The results showed that the wafer rotated during lapping, but this rotation fluctuated considerably according to the position of the carrier. In addition, the lattice groove pitch of the plate or carrier material, etc., affected the wafer rotation. The effects of wafer rotation while held by the carrier on processing characteristics were then clarified experimentally.</p>
Journal
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- Journal of the Japan Society for Abrasive Technology
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Journal of the Japan Society for Abrasive Technology 66 (9), 524-529, 2022-09-01
The Japan Society for Abrasive Technology
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Keywords
Details 詳細情報について
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- CRID
- 1390013795251495424
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- ISSN
- 18807534
- 09142703
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- Text Lang
- ja
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- Data Source
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- JaLC
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- Abstract License Flag
- Disallowed