Interfacial band offset analysis of TaO<sub>x</sub> nanosheet/SiO<sub>2</sub>/Si by surface charge-switched x-ray photoelectron spectroscopy
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- Hayami Shuhei
- Kyoto Univ.
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- Toyoda Satoshi
- Kyoto Univ.
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- Fukuda Katsutoshi
- Kyoto Univ.
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- Sugaya Hidetaka
- Kyoto Univ.
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- Nakata Akiyoshi
- Kyoto Univ.
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- Morita Masashi
- Kyoto Univ.
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- Uchimoto Yoshiharu
- Kyoto Univ.
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- Matsubara Eiichirou
- Kyoto Univ.
Bibliographic Information
- Other Title
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- 表面電荷反転XPS法によるTaO<sub>x</sub>ナノシート/SiO<sub>2</sub>/Si界面バンドオフセットの解析
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2016.1 (0), 1633-1633, 2016-03-03
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390013972156975232
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC