Etching characterization of Janus-type Triptycene (TripC<sub>12</sub>) in Cl<sub>2</sub> based inductively coupled plasma etching process
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- Matsutani Akihiro
- Semiconductor and MEMS Processing Center, Tokyo Tech
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- Ishiwari Fumitaka
- Chem. Res. Lab., Tokyo Tech
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- Shoji Yoshiaki
- Chem. Res. Lab., Tokyo Tech
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- Uehara Takuya
- IMRAM, Tohoku Univ.
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- Nakagawa Masaru
- IMRAM, Tohoku Univ.
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- Fukushima Takanori
- Chem. Res. Lab., Tokyo Tech JST-ERATO
Bibliographic Information
- Other Title
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- Cl<sub>2</sub>-誘導結合型プラズマエッチングにおけるヤヌス型トリプチセンTripC<sub>12</sub> のエッチング特性の評価
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2014.2 (0), 251-251, 2014-09-01
The Japan Society of Applied Physics
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Keywords
Details 詳細情報について
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- CRID
- 1390014945748538496
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC